R&D and BEST PRACTICES for MEASUREMENT in INDUSTRY
The International Metrology Congress will be back from 19 to 21 September 2017 in Paris (France), alongside with the ENOVA Show.
The event allows:
- to improve measurement, analysis and testing processes, and control risks,
- to follow the evolution of techniques, advances in R&D and discover industrial applications,
- to explore the exhibition showcasing innovations and solutions.
The presentations deal with:
- processes: uncertainties, calibration, verification, training, cost optimisation…
- techniques: mass, force, flow, dimensional, electricity, temperature, optics, chemical measures, biological measures…
- prospects: dynamic measures, additive manufacturing, data metrology, smart grids, nanotechnology, biotechnology and health, environmental concerns…
The call for papers is open until 15 January 2017: visit www.cim2017.com/index-en.html to send your abstract.
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For more information: 33 (0)4 67 06 20 36 - This email address is being protected from spambots. You need JavaScript enabled to view it. - www.cim2017.com/index-en.html |